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SPIE Proceedings [SPIE Photomask Japan '98 Symposium on Photomask and X-Ray Mask Technology V - Kawasaki City, Japan (Thursday 9 April 1998)] Photomask and X-Ray Mask Technology V - High-density plasma dry etch for DUV attenuated phase-shifting masks
Peng, Song, Adair, William J., Aizaki, NaoakiVolume:
3412
Year:
1998
Language:
english
DOI:
10.1117/12.328811
File:
PDF, 1.16 MB
english, 1998