SPIE Proceedings [SPIE Photomask Technology and Management - Monterey, CA (Wednesday 15 September 1999)] 19th Annual Symposium on Photomask Technology - Incorporation of laser proximity correction into mask production
Rosenbusch, Anja, Unruh, James, Kirsch, Hartmut, Chan, David Y., Abboud, Frank E., Grenon, Brian J.Volume:
3873
Year:
1999
Language:
english
DOI:
10.1117/12.373347
File:
PDF, 1.57 MB
english, 1999