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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Second-generation 193-nm bottom antireflective coatings (BARCs)
Meador, James D., Shao, Xie, Krishnamurthy, Vandana N., Arjona, Mikko, Bhave, Mandar, Xu, Gu, Claypool, James B., Lindgren, Anne, Houlihan, Francis M.Volume:
3999
Year:
2000
Language:
english
DOI:
10.1117/12.388264
File:
PDF, 1.61 MB
english, 2000