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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Emerging Lithographic Technologies IV - Film stress changes during anodic bonding of NGL masks
Cotte, Eric P., Schlax, Michael P., Engelstad, Roxann L., Lovell, Edward G., Brooks, Cameron J., Dobisz, Elizabeth A.Volume:
3997
Year:
2000
Language:
english
DOI:
10.1117/12.390089
File:
PDF, 2.37 MB
english, 2000