SPIE Proceedings [SPIE Microelectronic and MEMS Technologies - Edinburgh, United Kingdom (Wednesday 30 May 2001)] Process and Equipment Control in Microelectronic Manufacturing II - Final CD control through slope/sidewall angle correlation with stepper defocus and electrical parametric
Campbell, Robert L., Su, Bo, Seregely, Terry L., Wallace, Steve, Schantz, Frances H., Fallon, MartinVolume:
4405
Year:
2001
Language:
english
DOI:
10.1117/12.425243
File:
PDF, 133 KB
english, 2001