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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Optimal positions for SB assignment and the specification of SB width variation
Lai, Chih-Ming, Liu, Ru-Gun, Gau, Tsai-Sheng, Liang, Fu-Jye, Chou, Shuo-Yen, Shiu, Lin-Hung, Progler, Christopher J.Volume:
4346
Year:
2001
Language:
english
DOI:
10.1117/12.435683
File:
PDF, 433 KB
english, 2001