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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Encapsulated inorganic resist technology applied to 157-nm lithography
Fedynyshyn, Theodore H., Sinta, Roger F., Sworin, Michael, Goodman, Russell B., Doran, Scott P., Sondi, I., Matijevic, Egon, Houlihan, Francis M.Volume:
4345
Year:
2001
Language:
english
DOI:
10.1117/12.436860
File:
PDF, 630 KB
english, 2001