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SPIE Proceedings [SPIE Optical/Laser Microlithography IV - San Jose, United States (Wednesday 6 March 1991)] Optical/Laser Microlithography IV - Computer simulation of 0.5-micrometer lithography for a 16-megabit DRAM
Maltabes, John G., Norris, Katherine C., Writer, Dean, Pol, VictorVolume:
1463
Year:
1991
Language:
english
DOI:
10.1117/12.44792
File:
PDF, 396 KB
english, 1991