SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Novel surface imaging masking technique for high-aspect-ratio dry etching applications
Calabrese, Gary S., Abali, Livingstone N., Bohland, John F., Pavelchek, Edward K., Sricharoenchaikit, Prasit, Vizvary, Gerald, Bobbio, Stephen M., Smith, Patrick, Ito, HiroshiVolume:
1466
Year:
1991
Language:
english
DOI:
10.1117/12.46401
File:
PDF, 1.01 MB
english, 1991