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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Emerging Lithographic Technologies VI - Low-temperature wafer-scale warm embossing for mix and match with UV lithography
Schulz, Hubert, Wissen, Matthias, Roos, Nils, Scheer, Hella-Christin, Pfeiffer, Karl, Gruetzner, Gabi, Engelstad, Roxann L.Volume:
4688
Year:
2002
Language:
english
DOI:
10.1117/12.472295
File:
PDF, 1.04 MB
english, 2002