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SPIE Proceedings [SPIE Design, Process Integration, and Characterization for Microelectronics - Santa Clara, CA (Wednesday 6 March 2002)] Design, Process Integration, and Characterization for Microelectronics - New method for reducing across-chip poly-CD variation with statistical OPC/gauge capability analysis
Ohnuma, Hidetoshi, Kikuchi, Koji, Kawahira, Hiroichi, Starikov, Alexander, Tobin, Jr., Kenneth W.Volume:
4692
Year:
2002
DOI:
10.1117/12.475672
File:
PDF, 391 KB
2002