SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology IX - Yokohama, Japan (Tuesday 23 April 2002)] Photomask and Next-Generation Lithography Mask Technology IX - Hard pellicle study for 157-nm lithography
Shu, Emily Y., Lo, Fu-Chang, Eschbach, Florence O., Cotte, Eric P., Engelstad, Roxann L., Lovell, Edward G., Okada, Kaname, Kikugawa, Shinya, Kawahira, HiroichiVolume:
4754
Year:
2002
Language:
english
DOI:
10.1117/12.477011
File:
PDF, 900 KB
english, 2002