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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - Low-proximity contact hole formation by using double-exposure technology (DET)
Chang, Charles, Yang, Elvis, Wu, Tzong-Shane, Yang, Ta-Hung, Hsueh, Calvin C., Yen, AnthonyVolume:
5040
Year:
2003
Language:
english
DOI:
10.1117/12.485365
File:
PDF, 200 KB
english, 2003