SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology X - Yokohama, Japan (Wednesday 16 April 2003)] Photomask and Next-Generation Lithography Mask Technology X - Study of characteristics and control of haze contamination induced by photochemical reaction
Han, Sung-Jae, Tanabe, Hiroyoshi, Yu, Sang-Yong, Sung, Moon-Gyu, Kim, Yong-Hoon, Yoon, Hee-Sun, Sohn, Jung-MinVolume:
5130
Year:
2003
Language:
english
DOI:
10.1117/12.504277
File:
PDF, 491 KB
english, 2003