SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Emerging Lithographic Technologies VIII - Performance and stability of electron projection lithography tool
Sakaue, Hiroshi, Mackay, R. Scott, Koike, Kaoru, Takenaka, Hiroshi, Tsuchida, Takahiro, Koba, Fumihiro, Yamabe, MasakiVolume:
5374
Year:
2004
Language:
english
DOI:
10.1117/12.534892
File:
PDF, 404 KB
english, 2004