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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Data Analysis and Modeling for Process Control - Simulation benchmarking for the whole resist process
Kim, Sang-Kon, Tobin, Jr., Kenneth W., Lee, Ji-Eun, Park, Seung-Wook, Yoo, Ji-Yong, Oh, Hye-keunVolume:
5378
Year:
2004
Language:
english
DOI:
10.1117/12.536210
File:
PDF, 610 KB
english, 2004