SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - CD uniformity improvement by loading effect correction (LEC) function for 90-nm reticle
Lu, Colbert, Tanabe, Hiroyoshi, Huang, Torey, Lee, ShoneVolume:
5446
Year:
2004
Language:
english
DOI:
10.1117/12.562776
File:
PDF, 388 KB
english, 2004