SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Advances in Resist Technology and Processing IX - Deep-UV resists with improved delay capabilities
Funhoff, Dirk J. H., Binder, H., Schwalm, Reinhold, Novembre, Anthony E.Volume:
1672
Year:
1992
Language:
english
DOI:
10.1117/12.59725
File:
PDF, 239 KB
english, 1992