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SPIE Proceedings [SPIE Optical Metrology - Munich, Germany (Monday 13 June 2005)] Nano- and Micro-Metrology - Elimination of 'ghost'-effect-related systematic errors in metrology of x-ray optics with a long trace profiler
Yashchuk, Valeriy V., Ottevaere, Heidi, DeWolf, Peter, Irick, Steve C., MacDowell, Alastair A., Wiersma, Diederik S.Volume:
5858
Year:
2005
Language:
english
DOI:
10.1117/12.612386
File:
PDF, 1.36 MB
english, 2005