![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Application of CPL mask for whole chip 65nm DRAM patterning
Lin, Orson, Komuro, Masanori, Hung, Richard, Lee, Booky, Wu, Yuan-Hsun, Kozuma, Makoto, Shih, Chiang-Lin, Lin, Jengping, Hsu, Michael, Hsu, Stephen D.Volume:
5853
Year:
2005
Language:
english
DOI:
10.1117/12.617230
File:
PDF, 2.05 MB
english, 2005