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SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - Source polarization and OPC effects on illumination optimization
Brist, Travis, Weed, J. Tracy, Martin, Patrick M., Bailey, George E., Drozdov, Alexander, Torres, Andres, Estroff, Andrew, Hendrickx, EricVolume:
5992
Year:
2005
Language:
english
DOI:
10.1117/12.632371
File:
PDF, 342 KB
english, 2005