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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - In-line CD metrology with combined use of scatterometry and CD-SEM
Asano, Masafumi, Archie, Chas N., Ikeda, Takahiro, Koike, Toru, Abe, HideakiVolume:
6152
Year:
2006
Language:
english
DOI:
10.1117/12.656326
File:
PDF, 328 KB
english, 2006