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SPIE Proceedings [SPIE 26th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 18 September 2006)] Photomask Technology 2006 - No-forbidden-pitch SRAF rules for advanced contact lithography
Wang, Ching-Heng, Martin, Patrick M., Naber, Robert J., Liu, Qingwei, Zhang, Liguo, Hung, Chi-YuanVolume:
6349
Year:
2006
Language:
english
DOI:
10.1117/12.685071
File:
PDF, 387 KB
english, 2006