SPIE Proceedings [SPIE 26th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 18 September 2006)] Photomask Technology 2006 - Image degradation due to phase effects in chromeless phase lithography
Bubke, Karsten, Martin, Patrick M., Naber, Robert J., Sczyrba, Martin, Park, K. T., Neubauer, Ralf, Pforr, Rainer, Reichelt, Jens, Ziebold, RalfVolume:
6349
Year:
2006
Language:
english
DOI:
10.1117/12.685983
File:
PDF, 2.07 MB
english, 2006