SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - Immersion exposure tool for 45-nm HP mass production
Kubo, Hiroaki, Flagello, Donis G., Hata, Hideo, Sakai, Fumio, Deguchi, Nobuyoshi, Iwanaga, Takehiko, Ebihara, TakeakiVolume:
6520
Year:
2007
Language:
english
DOI:
10.1117/12.711360
File:
PDF, 713 KB
english, 2007