SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - MacroCD contact ellipticity measurement for lithography tool qualification
Englard, Ilan, Archie, Chas N., van Setten, Eelco, Janssen, Gert-Jan, Vanoppen, Peter, Minnaert-Janssen, Ingrid, Duray, Frank, Adan, Ofer, Moran, Amit, Gershtein, Liraz, Peltinov, RamVolume:
6518
Year:
2007
Language:
english
DOI:
10.1117/12.713469
File:
PDF, 425 KB
english, 2007