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SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - Self-aligned resist patterning with 172nm and 193nm backside flood exposure on attenuated phase shift masks
Chun, Jun, Naber, Robert J., Kawahira, Hiroichi, Ha, Taejoong, Jung, Hoyong, Jo, Sangjin, Han, OscarVolume:
6730
Year:
2007
Language:
english
DOI:
10.1117/12.746638
File:
PDF, 638 KB
english, 2007