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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Metrology, Inspection, and Process Control for Microlithography XXII - Picometer-scale accuracy in pitch metrology by optical diffraction and atomic force microscopy
Chernoff, Donald A., Allgair, John A., Raymond, Christopher J., Buhr, Egbert, Burkhead, David L., Diener, AlexanderVolume:
6922
Year:
2008
Language:
english
DOI:
10.1117/12.768429
File:
PDF, 784 KB
english, 2008