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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - OPC modeling setup with considering flare effect
Kim, Jong-doo, Choi, Jae-young, Kim, Jea-hee, Han, Jae-wonVolume:
6924
Year:
2008
Language:
english
DOI:
10.1117/12.772454
File:
PDF, 2.28 MB
english, 2008