SPIE Proceedings [SPIE SPIE Advanced Lithography - San...

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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Metrology, Inspection, and Process Control for Microlithography XXII - A novel methodology for model-based OPC verification

Huang, Tengyen, Allgair, John A., Raymond, Christopher J., Liao, ChunCheng, Chou, Ryan, Liao, Hung-Yueh, Schacht, Jochen
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Volume:
6922
Year:
2008
Language:
english
DOI:
10.1117/12.772522
File:
PDF, 642 KB
english, 2008
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