SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Metrology, Inspection, and Process Control for Microlithography XXII - Impact of assistance feature to pattern profile for isolated feature in sub-65 nm node
Kim, Myungsoo, Allgair, John A., Raymond, Christopher J., Yun, Young-Je, Jeong, Eunsoo, Choi, Kwangseon, Kim, Jeahee, Han, JaewonVolume:
6922
Year:
2008
Language:
english
DOI:
10.1117/12.773109
File:
PDF, 1.98 MB
english, 2008