SPIE Proceedings [SPIE Photomask and NGL Mask Technology XV - Yokohama, Japan (Wednesday 16 April 2008)] Photomask and Next-Generation Lithography Mask Technology XV - Rigorous vectorial modeling for polarized illumination and projection pupil in OPC
Zhang, Qiaolin, Horiuchi, Toshiyuki, Song, Hua, Lucas, Kevin, Ward, Brian, Shiely, JamesVolume:
7028
Year:
2008
Language:
english
DOI:
10.1117/12.793044
File:
PDF, 927 KB
english, 2008