SPIE Proceedings [SPIE 24th European Mask and Lithography Conference - Dresden, Germany (Monday 21 January 2008)] 24th European Mask and Lithography Conference - Alternative approach to transparent stamps for UV-based nanoimprint lithography: techniques and materials
Klukowska, Anna, Vogler, Marko, Kolander, Anett, Reuther, Freimut, Gruetzner, Gabi, Muehlberger, Michael, Bergmair, Iris, Schoeftner, RainerVolume:
6792
Year:
2008
Language:
english
DOI:
10.1117/12.798602
File:
PDF, 1.38 MB
english, 2008