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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Design for Manufacturability through Design-Process Integration III - Application of pixel-based mask optimization technique for high transmission attenuated PSM
Sakajiri, Kyohei, Singh, Vivek K., Rieger, Michael L., Trichkov, Alexander, Granik, Yuri, Hendrickx, Eric, Vandenberghe, Geert, Kempsell, Monica, Fenger, Germain, Boehm, Klaus, Scheruebl, ThomasVolume:
7275
Year:
2009
Language:
english
DOI:
10.1117/12.813753
File:
PDF, 1.73 MB
english, 2009