SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - Etch characterization of binary mask dependence on mask material and resist thickness for 22nm mask fabrication
Nemoto, Satoru, Hosono, Kunihiro, Faure, Thomas, Wistrom, Richard, Crawford, Shaun, Reid, Gary, Bartlau, Peter, Komizo, Toru, Zweber, Amy E.Volume:
7379
Year:
2009
Language:
english
DOI:
10.1117/12.824248
File:
PDF, 286 KB
english, 2009