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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Inspection of 32nm imprinted patterns with an advanced e-beam inspection system
Xiao, Hong, Zurbrick, Larry S., Montgomery, M. Warren, Ma, Long, Wang, Fei, Zhao, Yan, Jau, Jack, Selinidis, Kosta, Thompson, Ecron, Sreenivasan, S. V., Resnick, Douglas J.Volume:
7488
Year:
2009
Language:
english
DOI:
10.1117/12.833419
File:
PDF, 2.45 MB
english, 2009