SPIE Proceedings [SPIE SPIE Lithography Asia - Taipei,...

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SPIE Proceedings [SPIE SPIE Lithography Asia - Taipei, Taiwan (Wednesday 18 November 2009)] Lithography Asia 2009 - Novel assist feature design to improve depth of focus in low k1 EUV lithography

Kang, Hoyoung, Chen, Alek C., Han, Woo-Sung, Lin, Burn J., Yen, Anthony
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Volume:
7520
Year:
2009
Language:
english
DOI:
10.1117/12.849556
File:
PDF, 472 KB
english, 2009
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