![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Lithography Asia - Taipei, Taiwan (Wednesday 18 November 2009)] Lithography Asia 2009 - Novel assist feature design to improve depth of focus in low k1 EUV lithography
Kang, Hoyoung, Chen, Alek C., Han, Woo-Sung, Lin, Burn J., Yen, AnthonyVolume:
7520
Year:
2009
Language:
english
DOI:
10.1117/12.849556
File:
PDF, 472 KB
english, 2009