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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - A simulation study of cleaning induced EUV reflectivity loss mechanisms on mask blanks
Upadhyaya, Mihir, Denbeaux, Gregory, Kadaksham, Arun John, Jindal, Vibhu, Harris-Jones, Jenah, Lee, Byunghoon, Goodwin, Frank, Naulleau, Patrick P., Wood II, Obert R.Volume:
8322
Year:
2012
Language:
english
DOI:
10.1117/12.917972
File:
PDF, 1.52 MB
english, 2012