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SPIE Proceedings [SPIE Microlithography Conference - Santa Clara, CA (Monday 2 March 1987)] Advances in Resist Technology and Processing IV - Effect Of Diffuse Reflectivity On Photoresist Linewidth Control
Casalnuovo, Stephen A., Renschler, Clifford L., Stiefeld, Robyn E., Draper, Bruce L., Mahoney, A.Roderick, Bowden, Murrae J.Volume:
771
Year:
1987
Language:
english
DOI:
10.1117/12.940320
File:
PDF, 209 KB
english, 1987