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SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - Single Level Dry Developable Resist Systems, Based On Gas Phase Silylation
Schellekens, Jack P. W., Visser, Robert-Jan, Reichmanis, ElsaVolume:
1086
Year:
1989
Language:
english
DOI:
10.1117/12.953033
File:
PDF, 4.11 MB
english, 1989