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SPIE Proceedings [SPIE SPIE Optical Systems Design - Barcelona, Spain (Monday 26 November 2012)] Optical Systems Design 2012 - Detailed illuminator design for full-field ArF lithography system with a method based on the fly's eye
Wei, Lidong, Li, Yanqiu, Liu, Lihui, Mazuray, Laurent, Wartmann, Rolf, Wood, Andrew P., de la Fuente, Marta C., Tissot, Jean-Luc M., Raynor, Jeffrey M., Kidger, Tina E., David, Stuart, Benítez, Pablo,Volume:
8550
Year:
2012
Language:
english
DOI:
10.1117/12.980911
File:
PDF, 820 KB
english, 2012