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A Study of Electrical and Optical Properties of Boron-Doped Amorphous Silicon Deposited by RF-PECVD with Different B2H6/H2 Flow Rates
Dushaq, G., El-Atab, N., Rasras, M., Nayfeh, A.Volume:
72
Language:
english
Journal:
ECS Transactions
DOI:
10.1149/07202.0301ecst
Date:
May, 2016
File:
PDF, 175 KB
english, 2016