Nanoalignment mask fabricated directly on Si by AFM

Surface and Interface Analysis 2001 Vol. 32; Iss. 1

Nanoalignment mask fabricated directly on Si by AFM

WenHao Huang, Xueming Dang, Qiao Hu, Yi Xia, Marta Telllo, Montserrat Calleja, Ricardo García, J. M. Gómez-Rodńguez, A. Baro
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Volume:
32
Year:
2001
Language:
english
Pages:
3
DOI:
10.1002/sia.1023
File:
PDF, 106 KB
english, 2001
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