Partial reduction of Si(IV) in SiO2 thin film by deposited...

Surface and Interface Analysis 2001 Vol. 32; Iss. 1

Partial reduction of Si(IV) in SiO2 thin film by deposited metal particles: an XPS study

Masaharu Komiyama, Takemi Shimaguchi
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Volume:
32
Year:
2001
Language:
english
Pages:
4
DOI:
10.1002/sia.1034
File:
PDF, 94 KB
english, 2001
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