Analysis of the boundaries of ZrO2 and HfO2 thin films by...

Analysis of the boundaries of ZrO2 and HfO2 thin films by atomic force microscopy and the combined optical method

Petr Klapetek, Ivan Ohlídal, Daniel Franta, Pavel Pokorný
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Volume:
33
Year:
2002
Language:
english
Pages:
6
DOI:
10.1002/sia.1419
File:
PDF, 229 KB
english, 2002
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