Chemical stability of TiN, TiAlN and AlN layers in aggressive SO2 environments
J. F. Marco, J. R. Gancedo, M. A. Auger, O. Sánchez, J. M. AlbellaVolume:
37
Year:
2005
Language:
english
Pages:
10
DOI:
10.1002/sia.2083
File:
PDF, 511 KB
english, 2005