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Fragmentation of molecular compounds on silicon wafers and low dielectric constant materials studied by time-of-flight secondary ion mass spectrometry using a polyatomic ion source
X. Ravanel, C. Trouiller, M. Juhel, C. Wyon, L. F. T. Kwakman, D. LéonardVolume:
40
Year:
2008
Language:
english
Pages:
4
DOI:
10.1002/sia.2757
File:
PDF, 142 KB
english, 2008