Considerations of the intermediate oxides via XPS elemental quantitative analysis for the thickness measurements of ultrathin SiO2 on Si
Fen Liu, Zhijuan Zhao, Liangzhong Zhao, Hai WangVolume:
43
Year:
2011
Language:
english
Pages:
3
DOI:
10.1002/sia.3671
File:
PDF, 77 KB
english, 2011