Study of the redistribution of high dose Sb and P implants...

Surface and Interface Analysis 1988 Vol. 12; Iss. 6

Study of the redistribution of high dose Sb and P implants in silicon by combination of SIMS and TEM

G. Stingeder, M. Grasserbauer, P. Pongratz, W. Kuhnert, I. Wippel, P. Skalicky, E. Guerrero, H. Pötzl
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
12
Year:
1988
Language:
english
Pages:
3
DOI:
10.1002/sia.740120607
File:
PDF, 295 KB
english, 1988
Conversion to is in progress
Conversion to is failed