Electronic structures of N2+ and O2+ ion-implanted Si(100)

Electronic structures of N2+ and O2+ ion-implanted Si(100)

Hiroyuki Yamamoto, Yuji Baba, Teikichi A. Sasaki
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Volume:
23
Year:
1995
Language:
english
Pages:
5
DOI:
10.1002/sia.740230607
File:
PDF, 452 KB
english, 1995
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